{"id":163,"date":"2019-02-13T08:15:43","date_gmt":"2019-02-13T07:15:43","guid":{"rendered":"http:\/\/websrv.saske.sk\/imr\/?page_id=163"},"modified":"2019-06-07T14:12:10","modified_gmt":"2019-06-07T12:12:10","slug":"pristroje","status":"publish","type":"page","link":"https:\/\/websrv.saske.sk\/imr\/vedecke-divizie\/divizia-keramickych-a-nekovovych-systemov\/pristroje\/","title":{"rendered":"Pr\u00edstroje"},"content":{"rendered":"

Povlakovacie technol\u00f3gie<\/strong><\/span><\/h2>\n

Cryofox Discovery 500\u00a0(Polyteknik, Denmark)<\/h3>\n

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    \n
  • PVD zariadenie s HiPIMS a\u00a0DCMS zdrojmi po technickom zhodnoten\u00ed<\/li>\n
  • 3 nevyv\u00e1\u017een\u00e9 magnetr\u00f3ny (2 fokusovan\u00e9) s\u00a0DC a\u00a0HiPIMS zdrojmi<\/li>\n
  • Rotuj\u00faci dr\u017eiak s\u00a0ohrevom podlo\u017eiek do 500\u00a0o<\/sup>C a\u00a0pulzn\u00fdm predp\u00e4t\u00edm do -1400 V<\/li>\n
  • Reak\u010dn\u00e9 napra\u0161ovanie (N2<\/sub>, C2<\/sub>H2<\/sub>, H2<\/sub>, O2<\/sub>a\u00a0pod.)<\/li>\n<\/ul>\n

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    PQL S500\u00a0(PQL Ltd., United Kingdom)<\/h3>\n

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      \n
    • HiTUS technol\u00f3gia napra\u0161ovania tenk\u00fdch vrstiev a povlakov<\/li>\n
    • 4 ter\u010de s\u00a0priemerom 100 mm s\u00a0RF zdrojom pre vodiv\u00e9 aj nevodiv\u00e9 materi\u00e1ly<\/li>\n
    • Rotuj\u00faci dr\u017eiak s\u00a0ohrevom podlo\u017eiek do 500\u00a0o<\/sup>C a\u00a0RF predp\u00e4t\u00edm do 500 W<\/li>\n
    • Reak\u010dn\u00e9 napra\u0161ovanie\u00a0(N2<\/sub>, C2<\/sub>H2<\/sub>, H2<\/sub>, O2<\/sub>)<\/li>\n
    • in situ meranie teploty podlo\u017eky, r\u00fdchlosti napra\u0161ovania, zlo\u017eenia zvy\u0161kov\u00fdch plynov a\u00a0zlo\u017eenia plazmy (optickou spektroskopiou)<\/li>\n<\/ul>\n

      HiTUS umo\u017e\u0148uje nan\u00e1\u0161anie povlakov na plastov\u00e9 f\u00f3lie a pr\u00edpadne aj vysokotvrd\u00fdch povlakov na lo\u017eiskov\u00fa oce\u013e pri teplote pod 200 \u00b0C. Obe PVD technol\u00f3gie sa vyzna\u010duj\u00fa extr\u00e9mne vysok\u00fdm stup\u0148om ioniz\u00e1cie rozpra\u0161ovan\u00e9ho materi\u00e1lu, \u010do umo\u017e\u0148uje lep\u0161iu kontrolu v\u00fdsledn\u00fdch vlastnost\u00ed povlakov, najm\u00e4 hustoty a n\u00e1sledne aj tvrdosti, oteruvzdornosti a adh\u00e9zie povlaku k podlo\u017eke.<\/p>\n

       <\/p>\n

      Hybridn\u00fd PVD\/PE CVD syst\u00e9m<\/h3>\n
        \n
      • Elektr\u00f3nov\u00e9 delo max. 10 kV\/1,2A<\/li>\n
      • Magnetr\u00f3n s priemerom 10 cm a 1kW\/ 13,56 MHz<\/li>\n
      • Sublim\u00e1tor<\/li>\n
      • Predp\u00e4tie max. 5 kV\/ 3 A<\/li>\n
      • Syst\u00e9m nap\u00fa\u0161\u0165anie plynov N2<\/sub>, C2<\/sub>H2<\/sub>, H2<\/sub>, O2<\/sub><\/li>\n
      • Rota\u010dn\u00fd pr\u00edpravok Vysok\u00e1 r\u00fdchlos\u0165 rastu vrstiev 0,01 – 10 \u03bcm \/min<\/li>\n<\/ul>\n

         <\/p>\n

        Technol\u00f3gia pr\u00edpravy nano\/mikrovl\u00e1kien<\/strong><\/span><\/h2>\n

        NanospiderTM<\/sup>\u00a0NS LAB 200<\/h3>\n

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        Zariadenie, ktor\u00e9 poskytuje mo\u017enos\u0165 v\u00fdroby kontinu\u00e1lnych n\u00e1hodn\u00fdch alebo usporiadan\u00fdch \u00a0vl\u00e1kenn\u00fdch vrstiev s\u00a0r\u00f4znou plo\u0161nou hustotou a r\u00f4znymi priemermi vl\u00e1kien. Umo\u017e\u0148uje zvl\u00e1knenie \u0161irok\u00e9ho spektra materi\u00e1lov (r\u00f4znych druhov polym\u00e9rov, vr\u00e1tane biomateri\u00e1lov) s pou\u017eit\u00edm r\u00f4znych podkladov\u00fdch substr\u00e1tov. Polym\u00e9rne mikro\/nanovl\u00e1kna s\u00fa pou\u017e\u00edvan\u00e9 ako prekurzory keramick\u00fdch mikro\/nanovl\u00e1kien.<\/p>\n

        Parametre mikro\/nanovl\u00e1kien:<\/u><\/em><\/p>\n

          \n
        • Priemery: 50\u00a0\u2013 700\u00a0nm (\u00b130 %)<\/li>\n
        • D\u013a\u017eka: v\u00fdznamn\u00e1<\/li>\n
        • Vl\u00e1kna: kontinu\u00e1lne,\u00a0uniformn\u00e9<\/li>\n<\/ul>\n

          Parametre vrstvy:<\/u><\/em><\/p>\n

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          • Plo\u0161n\u00e1 hustota vrstvy: od 0,03 g\/m\u00b2<\/li>\n
          • Hr\u00fabka vrstvy: 1 \u2013 500 \u00b5m<\/li>\n
          • Efekt\u00edvna \u0161\u00edrka vrstvy: 250 \u2013 350 mm<\/li>\n<\/ul>\n

            Pr\u00edklady produkcie mikro\/nanovl\u00e1kien:<\/u><\/em><\/p>\n

              \n
            • Polym\u00e9ry: PA, PVA, PAN, PEO, PVP…<\/li>\n
            • Keramika: TiO2<\/sub>, Fe3<\/sub>O4<\/sub>, SnO2<\/sub>, Al2<\/sub>O3<\/sub>, ZrO2<\/sub>, ZnO, uhl\u00edkov\u00e9 nano\/mikrovl\u00e1kna, TiC…<\/li>\n
            • Biomateri\u00e1ly: chitosan, kolag\u00e9n, PAA, PLA, PCL, HA…<\/li>\n<\/ul>\n

               <\/p>\n

              Technol\u00f3gia pr\u00edpravy materi\u00e1lov z pr\u00e1\u0161kov<\/span><\/h2>\n

              SPS, model HP D10-SD (FCT Systeme GmbH, Germany)<\/h3>\n

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              Zariadenie, ktor\u00e9 poskytuje v\u00fdrobu nano\/mikro kompozitn\u00fdch keramick\u00fdch a kovov\u00fdch materi\u00e1lov pripraven\u00fdch z pr\u00e1\u0161kov met\u00f3dou spekania za pr\u00edtomnosti plazmy – Spark Plasma Sintering.<\/p>\n

                \n
              • Hydraulick\u00fd lis so silou 10 t [5 – 100 kN]<\/li>\n
              • Max. teplota 2200 \u00b0C, r\u00fdchlos\u0165 ohrevu 5 – 1000 K\/min.<\/li>\n
              • Zdroj jednosmern\u00e9ho pulzn\u00e9ho pr\u00fadu a\u017e 5500 A pri nap\u00e4t\u00ed 7,2 V<\/li>\n
              • Max. nepretr\u017eit\u00fd v\u00fdkon 37 kW<\/li>\n
              • Trvanie impulzu 1…255 ms, trvanie prest\u00e1vky 0…255 ms<\/li>\n
              • Procesn\u00e9 plyny – arg\u00f3n, dus\u00edk (max. 5 bar)<\/li>\n
              • V\u00e1kuum v studenej peci 5 x 10-2<\/sup> mbar<\/li>\n<\/ul>\n

                Charakteristika produkovan\u00fdch spekan\u00fdch materi\u00e1lov:<\/u><\/em><\/p>\n

                  \n
                • Priemery vzoriek m\u00f4\u017eu by\u0165 v rozsahu od 10 do 70 mm<\/li>\n
                • Hr\u00fabka vzorky m\u00f4\u017ee by\u0165 a\u017e 5 mm<\/li>\n
                • Mal\u00e1 ve\u013ekos\u0165 zrna – nanokompozitn\u00e9 materi\u00e1ly<\/li>\n
                • Ve\u013emi kr\u00e1tke spekacie \u010dasy 1 a\u017e 20 min\u00fat<\/li>\n<\/ul>\n

                  Pr\u00edklady produkcie spekan\u00fdch materi\u00e1lov:<\/u><\/em><\/p>\n

                    \n
                  • Kovy: W, Mo, Cr, Ru, Si, Cu<\/strong><\/li>\n
                  • Intermetalick\u00e9 materi\u00e1ly: TiAl, Ni3<\/sub>Al, PbTe, SmCo5<\/sub><\/strong><\/li>\n
                  • Karbidy: WC, B4<\/sub>C, SiC, TiC, ZrC<\/strong>, nitridy: AlN, TiN, Si3<\/sub>N4<\/sub>, hBN<\/strong><\/li>\n
                  • MMC\/CMC, materi\u00e1ly pre pancier: B4<\/sub>C, SiC, ZrB2<\/sub>, TiB2<\/sub>, Al2<\/sub>O3<\/sub> (+CNT)<\/strong><\/li>\n
                  • Transparentn\u00e9 materi\u00e1ly: spinel, Al2<\/sub>O3<\/sub><\/strong><\/li>\n
                  • Nano\u0161trukt\u00farovan\u00e9 materi\u00e1ly, funk\u010dne gradovan\u00e9 materi\u00e1ly<\/li>\n<\/ul>\n

                     <\/p>\n

                    Pr\u00edstroje na keramografick\u00fa pr\u00edpravu vzoriek<\/strong><\/span><\/h2>\n

                    Keramografick\u00e1 br\u00faska a le\u0161ti\u010dka TEGRAMIN 30<\/strong><\/h3>\n

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                      \n
                    • Individu\u00e1lny aj centr\u00e1lny pr\u00edtlak<\/li>\n
                    • Pr\u00edtlak vzorky od 5 N – 400 N<\/li>\n
                    • Nastavenie \u00faberu materi\u00e1lu s presnos\u0165ou 50 \u00b5m<\/li>\n
                    • Menite\u013en\u00e1 r\u00fdchlos\u0165 ot\u00e1\u010dania disku 40 – 600 ot.\/min.<\/li>\n
                    • Pohyb motorizovanej hlavy 50 – 150 ot.\/min.<\/li>\n
                    • D\u00e1vkovac\u00ed syst\u00e9m kontroluj\u00faci mno\u017estvo pou\u017eit\u00fdch suspenzi\u00ed na reprodukovate\u013en\u00fa pr\u00edpravu materi\u00e1lov<\/li>\n
                    • Chladenie kot\u00fa\u010da na pr\u00edpravu vzoriek citliv\u00fdch na teplotu<\/li>\n<\/ul>\n

                       <\/p>\n

                      Zariadenie na zalievanie\/zalisov\u00e1vanie keramick\u00fdch vzoriek Simplimet 3000<\/strong><\/h3>\n

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                      • Zalievanie\/zalisov\u00e1vanie keramick\u00fdch vzoriek za tepla do termosetick\u00fdch a termoplastick\u00fdch hm\u00f4t<\/li>\n
                      • Lisovacie formy na vzorky s priemerom 25 a 30 mm<\/li>\n
                      • Teplota lisovania od 50 \u00b0C do 180 \u00b0C<\/li>\n
                      • Lisovac\u00ed tlak od 80 bar do 300 bar<\/li>\n
                      • Lisovanie dvoch vzoriek s\u00fa\u010dasne<\/li>\n<\/ul>\n

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                        Presn\u00e1 automatick\u00e1 p\u00edla Secotom 15<\/strong><\/h3>\n

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                        • Kontrola rezania s automatickou korekciou reznej r\u00fdchlosti<\/li>\n
                        • Pou\u017eitie rezn\u00fdch kot\u00fa\u010dov s priemerom 75 – 200 mm<\/li>\n
                        • Menite\u013en\u00e1 r\u00fdchlos\u0165 ot\u00e1\u010dania kot\u00fa\u010da 300 – 5000 ot.\/min.<\/li>\n
                        • Uchytenie a rezanie vzoriek s rozmermi 165 x 50 mm<\/li>\n
                        • Delenie vzoriek do hr\u00fabky 70 mm s d\u013a\u017ekou rezu 190 mm<\/li>\n
                        • Nastavenie d\u013a\u017eky reznej dr\u00e1hy a automatick\u00e9 zastavenia rezania<\/li>\n
                        • Up\u00ednac\u00ed modul s polohovan\u00edm v x-ovej osi s presnos\u0165ou 5 \u00b5m<\/li>\n<\/ul>\n

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                          N\u00edzkoot\u00e1\u010dkov\u00e1 presn\u00e1 p\u00edla ISOMET 1000<\/strong><\/h3>\n

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                            \n
                          • Rezanie vzorky definovanou pr\u00edtla\u010dnou silou<\/li>\n
                          • Automatick\u00e9 zastavenie rezania po prerezan\u00ed vzorky alebo po dosiahnut\u00ed zvolenej h\u013abky rezu<\/li>\n
                          • Rezn\u00e9 kot\u00fa\u010de s priemerom do 178 mm<\/li>\n
                          • R\u00fdchlos\u0165 ot\u00e1\u010dania rezn\u00e9ho kot\u00fa\u010da od 25 do 950 ot.\/min.<\/li>\n
                          • Maxim\u00e1lne rozmery vzoriek do priemeru 38,1 mm s d\u013a\u017ekou 203 mm<\/li>\n
                          • Posun ramena dr\u017eiaka do 25 mm<\/li>\n<\/ul>\n

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                            Rozbrusovacia p\u00edla za mokra Delta Abrasimet<\/strong><\/h3>\n

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                            P\u00edla s diamantov\u00fdm kot\u00fa\u010dom na ru\u010dn\u00e9 hrub\u00e9 a r\u00fdchle rezanie tvrd\u00fdch keramick\u00fdch materi\u00e1lov v\u00e4\u010d\u0161\u00edch rozmerov.<\/p>\n

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                            • Maxim\u00e1lne ot\u00e1\u010dky rezn\u00e9ho kot\u00fa\u010da do 2830 ot.\/min.<\/li>\n
                            • Pou\u017eitie rezn\u00fdch kot\u00fa\u010dov s priemerom do 254 mm<\/li>\n
                            • Delenie vzoriek do priemeru max. 95 mm<\/li>\n
                            • Rezanie \u013eubovo\u013ene dlh\u00fdch vzoriek<\/li>\n
                            • Up\u00ednac\u00ed st\u00f4l s T-dr\u00e1\u017ekami rozmeru 210 x 210 mm<\/li>\n<\/ul>\n

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                              Naparova\u010dka JEE-420T<\/strong><\/h3>\n

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                              Pr\u00edstroj na pr\u00edpravu r\u00f4znych materi\u00e1lov vhodn\u00fdch pre vysokorozli\u0161ovacie pozorovania v transmisnom aj rastrovacom elektr\u00f3novom mikroskope. Vhodn\u00fd na r\u00fdchlu pr\u00edpravu uhl\u00edkov\u00fdch filmov pre TEM.<\/p>\n

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                              • Turbomolekul\u00e1rna pumpa dosahuj\u00faca v\u00e1kuum 7 x 10-5<\/sup> Pa a menej<\/li>\n
                              • Mo\u017enos\u0165 nakl\u00e1pania a rot\u00e1cie vzorky<\/li>\n
                              • Meranie hr\u00fabky nan\u00e1\u0161an\u00e9ho filmu<\/li>\n<\/ul>\n

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                                Napra\u0161ova\u010dka Q150T<\/strong><\/h3>\n

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                                Povlakovac\u00ed syst\u00e9m pre SEM, TEM, vysokorozli\u0161ovac\u00ed FE-SEM. Vysok\u00e9 v\u00e1kuum umo\u017e\u0148uje napra\u0161ovanie r\u00f4znych druhov kovov.<\/p>\n

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                                • Presn\u00e9 meranie hr\u00fabky nan\u00e1\u0161an\u00e9ho filmu<\/li>\n
                                • Rota\u010dn\u00fd planet\u00e1rny dr\u017eiak \u2019Rota-cota\u2019 s\u00a0 \u00f8 50 mm<\/li>\n<\/ul>\n

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                                  Zariadenia na pr\u00edpravu tenk\u00fdch f\u00f3li\u00ed pre pozorovanie na TEM<\/strong><\/span><\/h2>\n

                                  Ultrazvukov\u00e1 vyrez\u00e1va\u010dka<\/strong><\/h3>\n

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                                  • Vyrez\u00e1vanie diskov z tvrd\u00fdch a krehk\u00fdch materi\u00e1lov o priemere 2,3 mm a 3 mm, hr\u00fabky od 40 \u00b5m do 1 mm<\/li>\n<\/ul>\n

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                                    Br\u00faska diskov<\/strong><\/h3>\n

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                                    • Vyrez\u00e1vanie diskov z tvrd\u00fdch a krehk\u00fdch materi\u00e1lov o priemere 2,3 mm a 3 mm, hr\u00fabky od 40 \u00b5m do 1 mm<\/li>\n<\/ul>\n

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                                      Jamkovacia br\u00faska<\/strong><\/h3>\n

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                                      • Vyrez\u00e1vanie diskov z tvrd\u00fdch a krehk\u00fdch materi\u00e1lov o priemere 2,3 mm a 3 mm, hr\u00fabky od 40 \u00b5m do 1 mm<\/li>\n<\/ul>\n

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                                        Bombardova\u010dka PIPS 691<\/strong><\/h3>\n

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                                        Zariadenie pracuje na princ\u00edpe bombardovania vzorky Ar i\u00f3nmi a pr\u00edpravu elektr\u00f3novo transparentnej oblasti. Bombardovanie centr\u00e1lnej \u010dasti vzorky v tvare disku dvomi i\u00f3nov\u00fdmi delami. Syst\u00e9m umo\u017e\u0148uj\u00faci chladenie vzorky tekut\u00fdm dus\u00edkom.<\/p>\n

                                          \n
                                        • Spojit\u00e9 regulovanie energie l\u00fa\u010da od 100 eV do 6 kV<\/li>\n
                                        • Dve i\u00f3nov\u00e9 del\u00e1 s uhlami od +10\u00b0 do -10\u00b0<\/li>\n
                                        • Rot\u00e1cia vzorky od 1 ot.\/min. do 6 ot.\/min.<\/li>\n<\/ul>\n

                                           <\/p>\n

                                          Pr\u00edstroje na testovanie a vyhodnocovanie trec\u00edch, pevnostn\u00fdch vlastnost\u00ed, opotrebenia, povrchu a\u00a0zlo\u017eenia materi\u00e1lov<\/strong><\/span><\/h2>\n

                                          Vysoko-teplotn\u00fd Tribometer\u00a0 (CSM Instruments)<\/strong><\/h3>\n

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                                            \n
                                          • Met\u00f3da merania: Pin-on-disc<\/li>\n
                                          • Meranie s pou\u017eit\u00edm maziva, alebo bez<\/li>\n
                                          • Meranie na vzduchu, alebo v ochrannej atmosf\u00e9re<\/li>\n
                                          • Gul\u00f4\u010dka: s priemerom 6 mm<\/li>\n
                                          • Oce\u013e, \u0165a\u017ek\u00e9 kovy, Al2O3, Si3N4, ZrO2<\/li>\n
                                          • Statick\u00e9 za\u0165a\u017eenie: 0,1 \u2013 10 N<\/li>\n
                                          • Maxim\u00e1lne za\u0165a\u017eenie: 10 N<\/li>\n
                                          • Teplota: do 800 \u00b0C (do 1000 \u00b0C s pr\u00eddavnou pecou), \u00b1 3 \u00b0C<\/li>\n
                                          • Rot\u00e1cia: 0,3 \u2013 500 ot.\/min.<\/li>\n
                                          • Max. priemer: 30 mm<\/li>\n
                                          • Max. kr\u00fatiaci moment: 450 mNm<\/li>\n
                                          • V\u00fdstup: koeficien za\u0165a\u017eenia, opotrebenie<\/li>\n<\/ul>\n

                                             <\/p>\n

                                            Profilometer Mitutoyo SJ-201<\/strong><\/h3>\n
                                              \n
                                            • Meranie drsnosti a profilu<\/li>\n
                                            • Presnos\u0165 0,01 \u03bcm<\/li>\n<\/ul>\n

                                               <\/p>\n

                                              Nanotribometer CSM NTR2<\/strong><\/h3>\n

                                              \"\"<\/p>\n

                                               <\/p>\n

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                                               <\/p>\n

                                               <\/p>\n

                                               <\/p>\n

                                               <\/p>\n

                                               <\/p>\n

                                                \n
                                              • Extr\u00e9mne presn\u00e9 merania pri za\u0165a\u017eeniach do 1 N<\/li>\n
                                              • Kruhov\u00fd a recipro\u010dn\u00fd pohyb<\/li>\n
                                              • Presn\u00e9 testy mal\u00fdch vzoriek, biomateri\u00e1lov, polym\u00e9rov<\/li>\n<\/ul>\n

                                                 <\/p>\n

                                                Univerz\u00e1lny tribometer Bruker UMT 3<\/strong><\/h3>\n

                                                \"\"<\/p>\n

                                                 <\/p>\n

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                                                 <\/p>\n

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                                                 <\/p>\n

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                                                 <\/p>\n

                                                  \n
                                                • \u0160irok\u00fd rozsah mo\u017en\u00fdch sp\u00f4sobov expoz\u00edcie<\/li>\n
                                                • Kruhov\u00fd a recipro\u010dn\u00fd pohyb<\/li>\n
                                                • Sk\u00fa\u0161ky za sucha i v kvapalin\u00e1ch (testy lubrikantov)<\/li>\n
                                                • Testy lo\u017e\u00edsk – gu\u013e\u00f4\u010dky, val\u010deky<\/li>\n
                                                • Vy\u0161\u0161ie za\u0165a\u017eenie (5-1000 N)<\/li>\n
                                                • Presn\u00e9 testy mal\u00fdch vzoriek, biomateri\u00e1lov, polym\u00e9rov<\/li>\n<\/ul>\n

                                                   <\/p>\n

                                                  AFM Dimension ICON (Veeco Instruments)<\/strong><\/h3>\n

                                                  \"\"<\/p>\n

                                                   <\/p>\n

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                                                  Mikroskop at\u00f3mov\u00fdch s\u00edl (AFM), alebo silov\u00fd skenovac\u00ed mikroskop (SFM) je vysokorozli\u0161ovac\u00ed typ skenovacieho mikroskopu so sn\u00edma\u010dom s ve\u013ekos\u0165ou rozl\u00ed\u0161enia v nanometrickej oblasti. To umo\u017e\u0148uje ve\u013emi presne rekon\u0161truova\u0165 3D reprezentat\u00edvny topografick\u00fd poh\u013ead sk\u00faman\u00e9ho povrchu a sk\u00fama\u0165 mechanick\u00e9, elektrick\u00e9 a magnetick\u00e9 vlastnosti materi\u00e1lov. Meracie m\u00f3dy: Contact mode (also in fluids), Tapping mode (amplitude, phase imaging), Lateral Force Microscopy (LFM), Friction Force, Force Modulation, Magnetic FM, Electric FM, Surface Potential Detection, Dynamic modulation, Nanoindentation, Piezoresponse, Scanning Tunneling Microscopy, Peak Force QNM \u2013 quantitative nanomechanical mapping of material properties.<\/p>\n

                                                    \n
                                                  • Motorizovan\u00e9 zariadenie pohybuj\u00face sa po osi XY<\/li>\n
                                                  • Vzorky s max. r\u00e1diusom 120 mm<\/li>\n
                                                  • Oblas\u0165 skenovania 100\u00d7100 \u03bcm<\/li>\n
                                                  • N\u00edzka hlu\u010dnos\u0165, krycie veko<\/li>\n
                                                  • Video: 508 \u2013 4010x<\/li>\n
                                                  • Skener \u2013 zariadenie pohybuj\u00face sa v troch smeroch<\/li>\n<\/ul>\n

                                                     <\/p>\n

                                                    Mikro-nano indentor TTX NHT2 (CSM Instruments)<\/strong><\/h3>\n

                                                    \"\"<\/p>\n

                                                     <\/p>\n

                                                     <\/p>\n

                                                     <\/p>\n

                                                     <\/p>\n

                                                     <\/p>\n

                                                     <\/p>\n

                                                    In\u0161trumentovan\u00e1 indent\u00e1cia \/ nanoindent\u00e1cia je technika, kde v priebehu indenta\u010dn\u00e9ho procesu sa presne zaznamen\u00e1va h\u013aba preniku a za\u0165a\u017euj\u00faca sila po\u010das procesu za\u0165a\u017eovania a od\u013eah\u010dovania. Potom vieme vypo\u010d\u00edta\u0165 tvrdos\u0165, tuhos\u0165, modul pru\u017enosti a \u010fal\u0161ie mechanick\u00e9 vlastnosti ako funkciu h\u013abky.<\/p>\n

                                                      \n
                                                    • Programovate\u013en\u00e9 motorizovan\u00e9 zariadenie pohybuj\u00face sa po osi XY (presnos\u0165 \u2264 1 \u03bcm)<\/li>\n
                                                    • Za\u0165a\u017eenie 40 nN<\/li>\n
                                                    • Meranie indent\u00e1cie od 0,1 do 500 mN<\/li>\n
                                                    • Dynamick\u00e1 mechanick\u00e1 anal\u00fdza<\/li>\n
                                                    • Kontinu\u00e1lne multicyklick\u00e9 m\u00f3dy<\/li>\n
                                                    • M\u00f3d za\u0165a\u017eenia<\/li>\n<\/ul>\n

                                                       <\/p>\n

                                                      Nanoindentor Agilent G200<\/strong><\/h3>\n

                                                      \"\"<\/p>\n

                                                       <\/p>\n

                                                       <\/p>\n

                                                       <\/p>\n

                                                       <\/p>\n

                                                       <\/p>\n

                                                       <\/p>\n

                                                      Pr\u00edstroj pre realiz\u00e1ciu nanoindenta\u010dn\u00fdch meran\u00ed (meranie nanotvrdosti).<\/p>\n

                                                        \n
                                                      • \u00a0Vysok\u00e1 presnos\u0165 meran\u00ed<\/li>\n
                                                      • \u00a0Testovanie od 0,5 mN do 10 N<\/li>\n
                                                      • \u00a0Dynamick\u00e1 mechanick\u00e1 anal\u00fdza<\/li>\n
                                                      • \u00a0Skenovanie hrotom<\/li>\n
                                                      • \u00a0Microscratch testing<\/li>\n
                                                      • \u00a0Testovanie do tepl\u00f4t 500 \u00b0C<\/li>\n
                                                      • Meranie tvrdosti, pru\u017enosti, creepu, \u00fanavy, elasticko-plastick\u00fdch javov<\/li>\n
                                                      • Charakteriz\u00e1cia tenk\u00fdch povlakov, filmov a vrstiev<\/li>\n
                                                      • Mapovanie mechanick\u00fdch vlastnost\u00ed povrchu<\/li>\n
                                                      • Charakteriz\u00e1cia mechanick\u00fdch vlastnost\u00ed jednotliv\u00fdch f\u00e1z syst\u00e9mov\/kompozitov<\/li>\n
                                                      • Meranie anizotropie mechanick\u00fdch vlastnost\u00ed z\u0155n\/kry\u0161t\u00e1lov<\/li>\n<\/ul>\n

                                                         <\/p>\n

                                                        GD \u2013 Profiler 2 \u2013 optick\u00fd emisn\u00fd spektrometer (Horiba Yvon Jobin, France)<\/strong><\/h3>\n

                                                        \"\"<\/p>\n

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                                                        Spektrometer na operat\u00edvny v\u00fdskum chemickej anal\u00fdzy povrchu a\u00a0objemu, ako aj na h\u013abkov\u00fa profilov\u00fa prvkov\u00fa anal\u00fdzu \u0161irok\u00e9ho spektra materi\u00e1lov, od mas\u00edvnych kovov a\u017e po modern\u00e9 kompozitn\u00e9, nanokompozitn\u00e9 a biologick\u00e9 materi\u00e1ly a povlaky. Zariadenie umo\u017e\u0148uje r\u00fdchle, experiment\u00e1lne jednoduch\u00e9 a\u00a0ekonomicky nen\u00e1ro\u010dn\u00e9 meranie kvalitat\u00edvneho a\u00a0kvantitat\u00edvneho obsahu H, O, Cl, N, Nb, Cu, C, Zr, Ni, Co, P, S, Ti, Fe, Y, Mo, Ca, Al, La, V, Sr, Cr, W, Zn, B, Si, Mn, Hf, F a\u00a0K\u00a0v \u0161irokom spektre tuh\u00fdch l\u00e1tok, ich zmien v\u00a0procesoch oxid\u00e1cie, kor\u00f3zie, vplyvov vlhkosti, tribologickom a\u00a0inom opotreben\u00ed a\u00a0pod. u\u017e od koncentr\u00e1ci\u00ed na \u00farovni nieko\u013eko ppm pre potreby v\u00fdvoja nov\u00fdch technol\u00f3gi\u00ed a\u00a0\u0161t\u00fadia procesov ich pr\u00edpravy a pri prev\u00e1dzke.<\/p>\n

                                                          \n
                                                        • Polychrom\u00e1tor 0,5 m<\/li>\n
                                                        • Monochrom\u00e1tor<\/li>\n
                                                        • Detektory pre 31 spektr\u00e1lnych \u010diar<\/li>\n
                                                        • Gener\u00e1tor dus\u00edka<\/li>\n<\/ul>\n

                                                           <\/p>\n

                                                          Mikroskopia<\/span><\/h2>\n

                                                          Stemi 2000 C \u2013 stereomikroskop (Carl Zeiss, Germany)<\/strong><\/h3>\n

                                                          \"\"<\/p>\n

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                                                          Stereomikroskop na r\u00fdchle pozorovanie\u00a0povrchov v rozsahu zv\u00e4\u010d\u0161en\u00ed od 0,65 \u2013 50 x s CCD kamerou a ohniskovou vzdialenos\u0165ou do 92 mm.<\/p>\n

                                                           <\/p>\n

                                                          Axio Observer 1M \u2013 invertovan\u00fd optick\u00fd mikroskop\u00a0<\/strong>(Carl Zeiss, Germany)<\/strong><\/h3>\n

                                                          \"\"<\/p>\n

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                                                          Modern\u00fd sveteln\u00fd mikroskop s rozsahom zv\u00e4\u010d\u0161en\u00ed 25x \u2013 1000x pre pr\u00e1cu v svetlom poli, tmavom poli, v polarizovanom svetle a v re\u017eime diferenci\u00e1lneho interferen\u010dn\u00e9ho kontrastu (DIC).<\/p>\n

                                                           <\/p>\n

                                                          Neox Plu \u2013 konfok\u00e1lny mikroskop\/optick\u00fd profilometer (Sensofar, Spain)<\/strong><\/h3>\n

                                                          \"\"<\/p>\n

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                                                          Profilometer pre pozorovanie a meranie \u010dlenit\u00fdch povrchov v rozsahu zv\u00e4\u010d\u0161en\u00ed 50 \u2013 1500 x s v\u00fdborn\u00fdm rozl\u00ed\u0161en\u00edm v osi Z vhodn\u00fd na r\u00fdchle nekontaktn\u00e9 meranie drsnosti povrchov (bodov\u00e1, \u010diarov\u00e1, plo\u0161n\u00e1 anal\u00fdza) a prie\u010dnych profilov (napr. z\u00edskan\u00fdch zo st\u00f4p po sk\u00fa\u0161kach opotrebenia, vrypov\u00fdch sk\u00fa\u0161kach, indenta\u010dn\u00fdch sk\u00fa\u0161kach), vr\u00e1tane hr\u00fabky tenk\u00fdch vrstiev.<\/p>\n

                                                            \n
                                                          • Du\u00e1lne osvetlenie s\u00a0bielym aj\u00a0kr\u00e1tkovln\u00fdm monochromatick\u00fdm svetlom<\/li>\n
                                                          • Automatick\u00e9 prep\u00ednanie medzi konfok\u00e1lnym a\u00a0interferometrick\u00fdm m\u00f3dom len v\u00fdmenou objekt\u00edvu a\u00a0prepnut\u00edm softwaru<\/li>\n
                                                          • Vertik\u00e1lne rozl\u00ed\u0161enie v re\u017eime PSI \u00a0<0,02 nm<\/li>\n
                                                          • Odch\u00fdlka od linearity pri vertik\u00e1lnom skenovan\u00ed v rozsahu do 50 \u0265m < 60 nm<\/li>\n
                                                          • Vertik\u00e1lne rozl\u00ed\u0161enie v re\u017eime VSI <1,5 nm<\/li>\n
                                                          • R\u00fdchlos\u0165 sn\u00edmania v\u00a0konfok\u00e1lnom re\u017eime> 10 frame\/s<\/li>\n
                                                          • Interferometrick\u00e9 objekt\u00edvy so zv\u00e4\u010d\u0161en\u00edm v\u00a0rozsahu od 2,5x do 100x<\/li>\n
                                                          • Konfok\u00e1lne objekt\u00edvy so zv\u00e4\u010d\u0161en\u00edm v\u00a0rozsahu od 5x do 150x<\/li>\n
                                                          • Optick\u00e9 pozorovanie povrchu v\u00a0svetlom poli v\u00a0re\u00e1lnych farb\u00e1ch<\/li>\n
                                                          • Motorizovan\u00fd a\u00a0piezo-posun v\u00a0osi Z a motorizovan\u00fd XY stol\u00edk<\/li>\n
                                                          • Manu\u00e1lny prie\u010dny a\u00a0pozd\u013a\u017eny n\u00e1klon stol\u00edka<\/li>\n
                                                          • Software na automatick\u00e9 mapovanie a\u00a0skladanie obrazov zo zadan\u00fdch pl\u00f4ch a na vyhodnocovanie topografick\u00fdch parametrov povrchu<\/li>\n<\/ul>\n

                                                             <\/p>\n

                                                            XploRA \u2013 Ramanovsk\u00fd mikroskop (Horiba Yvon Jobin, France)<\/strong><\/h3>\n

                                                            \"\"<\/p>\n

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                                                            V\u00fdskumn\u00fd disperzn\u00fd Ramanovsk\u00fd mikroskop s\u00a0 tromi excita\u010dn\u00fdmi lasermi s r\u00f4znou vlnovou d\u013a\u017ekou, automaticky prep\u00ednate\u013en\u00fdmi mrie\u017ekami spektrografu, spektr\u00e1lnym rozl\u00ed\u0161en\u00edm lep\u0161\u00edm ako 3,4 cm-1<\/sup>, r\u00fdchlym a\u00a0 presn\u00fdm automatizovan\u00fdm mapovan\u00edm a vyhodnocovac\u00edm softwarom kombinovan\u00fd s\u00a0optick\u00fdm mikroskopom umo\u017e\u0148uj\u00facim pozorovanie v\u00a0svetlom a\u00a0tmavom poli.<\/p>\n

                                                              \n
                                                            • Automatick\u00e9 prep\u00ednanie medzi lasermi a\u00a0ich automatick\u00e1 kalibr\u00e1cia<\/li>\n
                                                            • Automatick\u00e9 nastavenie konfok\u00e1lnej apert\u00fary<\/li>\n
                                                            • Spektr\u00e1lne rozl\u00ed\u0161enie pri mrie\u017eke 2400 vrypov\/mm a vlnovej d\u013a\u017eke lasera 532 nm minim\u00e1lne 3,4cm-1<\/sup><\/li>\n
                                                            • Rozsah vlnov\u00fdch \u010d\u00edsel pri mrie\u017eke 2400 vrypov\/mm a vlnovej d\u013a\u017eke lasera \u00a0532 nm od 200 do 3000 cm-1<\/sup><\/li>\n
                                                            • 4 automaticky prep\u00ednate\u013en\u00e9 mrie\u017eky spektrografu<\/li>\n
                                                            • Automatick\u00e9 mapovanie s\u00a0dobou sn\u00edmania 1 bodu pod 100 ms\/bod<\/li>\n
                                                            • Krok XY stol\u00edka men\u0161\u00ed ako 0,5 um<\/li>\n
                                                            • Software na vyhodnocovanie so\u00a0z\u00e1kladnou datab\u00e1zou na identifik\u00e1ciu spektier<\/li>\n
                                                            • Objekt\u00edvy optick\u00e9ho mikroskopu so zv\u00e4\u010d\u0161en\u00edm 10x, 50x a\u00a0100x<\/li>\n
                                                            • Farebn\u00e1 CCD kamera s\u00a0min. 1 mil. pixelov<\/li>\n<\/ul>\n

                                                               <\/p>\n

                                                              SEM EVO MA15\u00a0\u2013 Environment\u00e1lny Rastrovac\u00ed elektr\u00f3nov\u00fd mikroskop\u00a0<\/strong>(Carl Zeiss, Germany)<\/strong><\/h3>\n

                                                              \"\"<\/p>\n

                                                               <\/p>\n

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                                                              Environment\u00e1lny rastrovac\u00ed elektr\u00f3nov\u00fd mikroskop s integrovan\u00fdmi analytick\u00fdmi met\u00f3dami EDX a WDX (Oxford Instruments, United Kingdom). Vybaven\u00fd W vl\u00e1knom s roz\u0161\u00edren\u00fdm rozsahom pracovn\u00fdch tlakov a s integrovan\u00fdmi\u00a0 analytick\u00fdmi met\u00f3dami na pozorovanie a v\u00fdskum mikro\u0161trukt\u00fary, topografie a chemick\u00e9ho zlo\u017eenia \u0161irok\u00e9ho spektra materi\u00e1lov, od mas\u00edvnych kovov a\u017e po modern\u00e9 kompozitn\u00e9, nanokompozitn\u00e9 a biologick\u00e9 materi\u00e1ly a povlaky s roz\u0161\u00edren\u00fdmi mo\u017enos\u0165ami anal\u00fdzy \u013eahk\u00fdch prvkov.<\/p>\n

                                                                \n
                                                              • W vl\u00e1kno<\/li>\n
                                                              • SE a\u00a0BSE detektory pre pr\u00e1cu pri zv\u00fd\u0161enom tlaku<\/li>\n
                                                              • Rozsah pracovn\u00fdch tlakov v\u00a0komore v\u00a0rozsahu do 400 Pa<\/li>\n
                                                              • 5-osov\u00fd motorizovan\u00fd stol\u00edk<\/li>\n
                                                              • Ve\u013ek\u00e1 komora<\/li>\n
                                                              • Bezolejov\u00e9 v\u00e1kuum<\/li>\n<\/ul>\n

                                                                 <\/p>\n

                                                                SEM\/FIB \u2013 CrossBeam syst\u00e9m AURIGA Compact<\/strong><\/h3>\n

                                                                \"\"<\/p>\n

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                                                                SEM\/FIB kombinovan\u00fd \u201edual beam\u201c mikroskop ur\u010den\u00fd na prec\u00edzne \u0161trukt\u00farne a\u00a0chemick\u00e9 anal\u00fdzy, 2D, 3D zobrazovanie vo vysokom rozl\u00ed\u0161en\u00ed (sekund\u00e1rne elektr\u00f3ny, sp\u00e4tne odrazen\u00e9 elektr\u00f3ny, 3D energiovo-disperzn\u00e1 anal\u00fdza, In-lens duo a\u00a0STEM detektor) a\u00a0na mikro\/nanoobr\u00e1banie. Vhodn\u00e9 pre dvoj- a\u00a0troj-rozmern\u00e9 zobrazovanie a\u00a0anal\u00fdza vodiv\u00fdch i\u00a0nevodiv\u00fdch materi\u00e1lov s\u00a0pou\u017eit\u00edm lok\u00e1lneho kompenz\u00e1tora n\u00e1boja, pre pr\u00edpravu ultratenk\u00fdch lamiel (<50 nm) pre pozorovanie v\u00a0TEM (aj z\u00a0miest, ktor\u00e9 s\u00fa pre in\u00e9 met\u00f3dy nedostupn\u00e9- indent\u00e1cie, opotrebenie, pre pr\u00edpravu vodiv\u00fdch i\u00a0nevodiv\u00fdch nano\u0161trukt\u00far (< 20 nm) cestou depoz\u00edcie z\u00a0plynnej f\u00e1zy, mletie, bombardovanie, i\u00f3nov\u00e9 leptanie materi\u00e1lov, I\u00f3nov\u00e1 litografia a anal\u00fdza prie\u010dnych rezov a\u00a0\u0161trukt\u00farnych rozhran\u00ed materi\u00e1lov na stanovenie odolnosti \u00a0vo\u010di opotrebeniu, kor\u00f3zii, \u010di oxid\u00e1cii, meranie hr\u00fabky vrstiev, anal\u00fdza ch\u00fdb v materi\u00e1li a pr\u00edprava mikro\u00fatvarov (pilierov) pre n\u00e1sledn\u00e9 nanomechanick\u00e9 sk\u00fa\u0161anie.<\/p>\n

                                                                  \n
                                                                • SEM (rastrovacia elektr\u00f3nov\u00e1 mikroskopia)<\/li>\n
                                                                • Rozl\u00ed\u0161enie 0,9 nm pri 30 kV (STEM m\u00f3d), 2,5 nm pri 1 kV<\/li>\n
                                                                • Zv\u00e4\u010d\u0161enie 12x-900 000x<\/li>\n
                                                                • FIB (fokusovan\u00fd zv\u00e4zok i\u00f3nov)<\/li>\n
                                                                • Rozl\u00ed\u0161enie 5 nm (30 kV, 1 pA)<\/li>\n
                                                                • Zv\u00e4\u010d\u0161enie 600x \u2013 500\u00a0000x<\/li>\n<\/ul>\n

                                                                   <\/p>\n

                                                                  Creepovacie zariadenia<\/strong><\/span><\/h2>\n

                                                                  Creepovacie stroje<\/strong><\/h3>\n

                                                                  \"\"<\/p>\n

                                                                   <\/p>\n

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                                                                   <\/p>\n

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                                                                   <\/p>\n

                                                                   <\/p>\n

                                                                    \n
                                                                  • \u0164ahov\u00e9 sk\u00fa\u0161ky te\u010denia (creepov\u00e9 sk\u00fa\u0161ky) kovov\u00fdch materi\u00e1lov pri kon\u0161tantnom za\u0165a\u017een\u00ed<\/li>\n
                                                                  • Teplotn\u00fd rozsah sk\u00fa\u0161ok od 200 \u00b0C do 650 \u00b0C<\/li>\n
                                                                  • Rozsah po\u010diato\u010dn\u00fdch za\u0165a\u017eovac\u00edch nap\u00e4t\u00ed od cca. 50 MPa do 200 MPa<\/li>\n
                                                                  • Mo\u017enos\u0165 kontinu\u00e1lneho merania creepovej deform\u00e1cie LVDT sn\u00edma\u010dmi s presnos\u0165ou 1 \u03bcm<\/li>\n
                                                                  • Mo\u017enos\u0165 stanovenia creepovej \u017eivotnosti (doby do lomu) a creepov\u00fdch plastick\u00fdch vlastnost\u00ed<\/li>\n<\/ul>\n

                                                                     <\/p>\n

                                                                    Vysokoteplotn\u00e1 pec HTTF-2<\/strong><\/h3>\n

                                                                    \"\"<\/p>\n

                                                                     <\/p>\n

                                                                     <\/p>\n

                                                                     <\/p>\n

                                                                     <\/p>\n

                                                                     <\/p>\n

                                                                     <\/p>\n

                                                                     <\/p>\n

                                                                    Zariadenie na mechanick\u00e9 testovanie progres\u00edvnych keramick\u00fdch materi\u00e1lov pri teplot\u00e1ch do 1500 \u00b0C pri za\u0165a\u017een\u00ed do 1 kN pri teplote do 1500 \u00b0C. Pec je vybaven\u00e1 kontinu\u00e1lnym syst\u00e9mom za\u0165a\u017eenia pri vysok\u00fdch teplot\u00e1ch.<\/p>\n

                                                                      \n
                                                                    • \u0160tvorbodov\u00fd creep v ohybe, tlakov\u00fd a\u00a0indenta\u010dn\u00fd creep do 1500 \u00b0C<\/li>\n
                                                                    • Meranie vysokoteplotnej ohybovej pevnosti do 1500 \u00b0C<\/li>\n
                                                                    • Meranie rastu trhliny pri zv\u00fd\u0161enej teplote do 1500 \u00b0C<\/li>\n
                                                                    • Meranie odolnosti vo\u010di tepeln\u00fdm \u0161okom<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"

                                                                      Povlakovacie technol\u00f3gie Cryofox Discovery 500\u00a0(Polyteknik, Denmark)               PVD zariadenie s HiPIMS a\u00a0DCMS zdrojmi po technickom zhodnoten\u00ed 3 nevyv\u00e1\u017een\u00e9 magnetr\u00f3ny…<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":108,"menu_order":60,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-163","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/pages\/163","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/comments?post=163"}],"version-history":[{"count":28,"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/pages\/163\/revisions"}],"predecessor-version":[{"id":1179,"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/pages\/163\/revisions\/1179"}],"up":[{"embeddable":true,"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/pages\/108"}],"wp:attachment":[{"href":"https:\/\/websrv.saske.sk\/imr\/wp-json\/wp\/v2\/media?parent=163"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}